SPECTROSCOPIC ELLIPSOMETRY
Spectroscopic ellipsometry is a surface-sensitive, non-destructive & non-intrusive optical technique commonly used to determine film thickness and optical constants (n, k). Ellipsometer is ideal for thin-film applications across various fields such as semiconductors, photovoltaics, optoelectronics, optical & functional coatings, surface chemistry, and biotechnology.
Fast Automatic Ellipsometer
A fast, easy-to-use automatic ellipsometer that provides results and reports in a matter of seconds. It is the ideal instrument for repetitive & routined thin film measurements.
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SPECIFICATIONS
Spectral Range 440-1000 nm Spot Sizes 500x500 µm; 250x500 µm; 250x250 µm; 70x250 µm; 100x100 µm; 50x60 µm; 25x60 µm Detection CCD – Resolution: 2nm |
Modular Ellipsometer
Smart SE is an innovative and flexible ellipsometer which provides fast results in either an ex-situ or in-situ configuration. The modular ellipsometer is a research-grade instrument that is highly efficient & competitive.
Smart SE provides an integrated vision system for accurate spot positioning, seven automated micro spots with size ranging down to a few tens of microns for measurement of small features, and the ability to measure the complete 16-element Mueller matrix in just a few seconds for the study of complex samples. Additionally, Smart SE's flexible design allows full automation of the sample stage and goniometer as well as in-situ use on process chambers. |
SPECIFICATIONS
Spectra Range 450nm to 1000nm Spectra Resolution Better than 3nm Light Source Combined Halogen and Blue LED Measurement Time <1sec - 10 sec Beam Size 75µm * 150µm, 100µm * 250µm,100µm * 500µm, 150µm * 150µm,250µm * 250µm, 250µm * 500µm,500µm*500µm |
VUV Ellipsometer
Specially designed for VUV measurement, the second generation phase modulation ellipsometer is one of the only instrument capable of delivering the fastest thin film measurements over the largest wavelength range (147 to 2100 nm).
Requiring no oxygen absorption with the acquisition, the UVISEL 2 VUV is a hybrid that operates in either nitrogen or primary vacuum. It is a unique VUV spectral ellipsometry that is capable of producing high accuracy, fast measurement with fast vacuum ability. This allows users to change in and out of samples quickly while using low amounts of nitrogen. |
SPECIFICATIONS
Light Source Combination Deuterium 150W & 75W Xenon lamps Spot Size Manual selection of eight spot sizes. Standard Spot Size 2 x 6 mm Spectral Range 147 - 850 nm NIR extension up to 2100 nm Photoelastic Modulator CaF2 Modulation Frequency 50 kHz Double Monochromator VUV-VIS PMT detectors, motorized slits in option NIR: InGaAs detector |
In-Line Ellipsometer
This ellipsometer uses the turn-key thin-film metrology for in-line measurement of thin film thickness and optical properties.
It features rapid measurement with data acquired every 50 ms for powerful control of thin-film uniformity across the entire web. |
SPECIFICATIONS
In-line measurement of film thickness and optical constants (n,k) Substrate Materials PET, PEN, PI, PC, PA, TAC… Thin Film Materials Dielectrics Al2O3, SiN, SiO2, Ta2O5, TiO2, Nb2O5… Polymers, organic LED films Transparent electrodes ITO, AZO, i:ZnO Thin metal films Ag, Al, Cr, Cu |
In-Situ Ellipsometer
The UVISEL Plus is an in-situ spectroscopic ellipsometer designed to be mount easily on process chambers (PECVD, MOCVD, sputter, evaporation, ALD, MBE) for the real-time control of thin-film deposition or etches processes. It is a self-sufficient instrument; with a fully integrated software package for real-time measurement, modelling and reporting.
Additionally, with the new & unique adaptation kit, the ellipsometer can operate for both in-situ & benchtop applications on a goniometer; switching between the two configurations and aligning the system becomes relatively straightforward. |
SPECIFICATIONS
Spectral Ranges 190-920 nm 190-2100 nm Light Source 75W Xe lamp 150W Xe lamp Detection Single point or real-time spectral acquisition using high sensitivity Wide dynamic range PMT detectors or scanning monochromator for in-situ measurement in working environment for thin film deposition/etch control |
Reference Ellipsometer for thin films
The ellipsometer from FUV to NIR. This is is the best ellipsometer, offering modularity & performance for advanced thin film, surface & interface characterisation.
Using phase modulation technology, the ellipsometer is capable of providing a powerful optical design which continuously cover the spectral range (190 to 2100 nm). High quality data are delivered across the whole spectral range with the highest accuracy, resolution measurements & excellent signal to noise ratio. |
SPECIFICATIONS
Spectral Range 190 to 920 nm NIR extension option up to 2100 nm Detection High resolution monochromator coupled to sensitive detectors Spot Size 0.05 – 0.1 – 1 mm (pinhole) Accuracy Ψ= 45°±0.01° and Δ=0°±0.01° measured in straight-through air configuration 1.5 – 5.3 eV Repeatability NIST 1000Å SiO2/Si (190-2100 nm): d ± 0.1 % – n(632.8nm) ± 0.0001 |
Related Instruments
Monochromator
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CCD Detectors
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*Pictures shown above are for reference only. Actual product may differ slightly.
**Some products may not be available in all countries. Please contact us for further information and clarification. |
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